Generalized ellipsometry of artificially designed line width roughness

作者：Foldyna Martin^*; Germer Thomas A; Bergner Brent C; Dixson Ronald G

来源：Thin Solid Films, 2011, 519(9): 2633-2636.

DOI：10.1016/j.tsf.2010.11.085

• Biperiodic grating
• Diffraction grating
• Ellipsometry
• Line width roughness
• Mueller matrix
• Multi-azimuth method
• RCWA

We use azimuthally resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line width roughness (LWR). We model the artificially perturbed grating using one- and two-dimensional rigorous coupled-wave methods in order to evaluate the sensitivity of the experimental spectrally resolved data, measured using a generalized ellipsometer, to the dimensional parameters of LWR. The sensitivity is investigated in the context of multiple conical mounting (azimuth angle) configurations, providing more information about the grating profile. Published by Elsevier B.V.

• 出版日期2011-2-28