A novel photobleachable polysilane copolymer for optical waveguide fabrication

作者：He, Lei^*; Chen, Baoxue; Iso, Mamoru

来源：Polymers for Advanced Technologies, 2011, 22(6): 1056-1059.

DOI：10.1002/pat.1615

• poly(methylphenylsilane)-poly(benzylmethacrylate)
• photobleaching
• refractive index
• optical waveguide

Poly(methylphenylsilane)-poly(benzylmethacrylate) (PMPS-PBzMA) block copolymer was prepared by photopolymerization of benzylmethacrylate (BzMA) monomer using PMPS as a macromolecular photo-radical initiator. Its application as a photobleachable polymer material for optical waveguide fabrication was investigated. By changing weight ratios of BzMA to PMPS during polymerization, the obtained PMPS-PBzMA showed different photo-induced refractive changes. PMPS-PBzMA proved to have good photosensitivity, optical properties, and thermal stability. A multimode PMPS-PBzMA optical waveguide was achieved, with a propagation loss of 1.0 dB/cm at 1310 nm.

• 出版日期2011-6
• 单位上海理工大学