A combined scanning tunneling microscope-atomic layer deposition tool

作者：Mack James F^*; Van Stockum Philip B; Iwadate Hitoshi; Prinz Fritz B

来源：Review of Scientific Instruments, 2011, 82(12): 123704.

DOI：10.1063/1.3669774

• atomic layer deposition
• electric fields
• nanofabrication
• scanning tunnelling microscopy
• vibration isolation

We have built a combined scanning tunneling microscope-atomic layer deposition (STM-ALD) tool that performs in situ imaging of deposition. It operates from room temperature up to 200 degrees C, and at pressures from 1 x 10(-6) Torr to 1 x 10(-2) Torr. The STM-ALD system has a complete passive vibration isolation system that counteracts both seismic and acoustic excitations. The instrument can be used as an observation tool to monitor the initial growth phases of ALD in situ, as well as a nanofabrication tool by applying an electric field with the tip to laterally pattern deposition. In this paper, we describe the design of the tool and demonstrate its capability for atomic resolution STM imaging, atomic layer deposition, and the combination of the two techniques for in situ characterization of deposition.

• 出版日期2011-12