Homogeneous nano-patterning using plasmon-assisted photolithography

作者：Ueno Kosei^*; Takabatake Satoaki; Onishi Ko; Itoh Hiroko; Nishijima Yoshiaki; Misawa Hiroaki

来源：Applied Physics Letters, 2011, 99(1): 011107.

DOI：10.1063/1.3606505

We report an innovative lithography system appropriate for fabricating sharp-edged nanodot patterns with nanoscale accuracy using plasmon-assisted photolithography. The key technology is two-photon photochemical reactions of a photoresist induced by plasmonic near-field light and the scattering component of the light in a photoresist film. The scattering component of the light is a radiation mode from higher order localized surface plasmon resonances scattered by metallic nanostructures.

• 出版日期2011-7-4