Amorphous hydrogenated carbon films used as masks for silicon microtips fabrication in a reactive ion etching with SF6 plasma

作者：Alves MAR; Porto LF; de Faria PHL; Braga ES^*

来源：Vacuum, 2004, 72(4): 485-488.

DOI：10.1016/j.vacuum.2003.10.012

• silicon microtips
• hydrogenated carbon films
• SF6 plasma

A room temperature fabrication process for silicon microtips has been developed using amorphous hydrogenated carbon films as masks for silicon etching. Reactive ion etching using an SF6 plasma has been employed to sharpen the microtips without any thermal oxidation technique.

• 出版日期2004-1-16