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摘要
A method for developing complex nanopatterns on surfaces has been developed by combining self-assembly, photolabile protecting groups, and in multilayered films. An o-nitrobenzyl protecting group has been incorporated into molecular level films utilizing thiol-gold interactions. When the o-nitrobenzyl group is cleaved by ultraviolet light, a carboxylic acid terminated layer remains on the surface and is available for activation and further functionalization through amide bond formation. Using this method, multilayered films have been constructed and characterized by contact angle goniometry, cyclic voltammetry, grazing incidence infrared spectroscopy, and X-ray photoelectron spectroscopy measurements. Complex surface patterns can be achieved by creating, a surface using a photomask and then further functionalizing the irradiated area through covalent coupling. Fluorophores were attached to the deprotected regions, providing visual evidence of surface patterning using fluorescence microscopy. This approach is universal to bind moietics containing free amine groups at defined regions across a surface, allowing, for the development of films with complex chemical and physicochemical properties.
- 出版日期2010-3-2
