Mathematical model for the surface relief formation of photographic emulsions

作者：Navarrete Garcia E^*; Calixto S

来源：Journal of Microlithography Microfabrication and Microsystems, 2005, 4(2): 023010.

DOI：10.1117/1.18973851

• micro-optics
• optical fabrication
• simulations

We present a mathematical model of the surface relief formation suffered by photographic emulsions when an intensity pattern is recorded. Traditional explanations consider that this relief is due to silver compounds, but mainly to a mass transfer process in presence of tension forces. According to this description, the model considers diffusion and smoothing processes. Main parameters of the model were obtained by fitting simulated profiles to measured profiles for different microoptical elements. The error between simulated and measured profiles ranged from 2.6% to 7.3%. Results obtained with this model reinforce the hypothesis of the surface relief formation. This model may be useful in numerical simulations of surface relief micro optical elements. 0 2005 Society of Photo-Optical Instrumentation Engineers.

• 出版日期2005-6