Degradation pattern of SnO2 nanowire field effect transistors

作者:Na Junhong*; Huh Junghwan; Park Sung Chan; kim DaeIl; Kim Dong Wook; Lee Jae Woo; Hwang In Sung; Lee Jong Heun; Ha Jeong Sook; Kim Gyu Tae
来源:Nanotechnology, 2010, 21(48): 485201.
DOI:10.1088/0957-4484/21/48/485201

摘要

The degradation pattern of SnO2 nanowire field effect transistors (FETs) was investigated by using an individual SnO2 nanowire that was passivated in sections by either a PMMA (polymethylmethacrylate) or an Al2O3 layer. The PMMA passivated section showed the best mobility performance with a significant positive shift in the threshold voltage. The distinctive two-dimensional R-s-mu diagram based on a serial resistor connected FET model suggested that this would be a useful tool for evaluating the efficiency for post-treatments that would improve the device performance of a single nanowire transistor.

  • 出版日期2010-12-3