Embedded nano channels fabricated by non-selective reverse contact UV nanoimprint lithography technique

作者：Kehagias N^*; Chansin G; Reboud V; Zelsmann M; Schuster C; Kubenz M; Reuther F; Gruetzner G; Torres C M Sotomayor

来源：Microelectronic Engineering, 2007, 84(5-8): 921-924.

DOI：10.1016/j.mee.2007.01.057

• reverse nanoimprint lithography
• three-dimensional nanofabrication

In this work, a novel nanofabrication technique is presented, namely "Reverse contact Ultraviolet Nanoimprint Lithography" (RUV-NIL). It is based on reverse nanoimprint lithography and ultraviolet contact lithography. It provides flexibility in building complex three-dimensional structures allowing selective imprint over pre-patterned surfaces with or without residual layer in opposition to what is often encountered in the normal NIL process. We have investigated and optimized the imprinting parameters that are required for three-dimensional nanofabrication and applied it to the fabrication of nano-fluidic channels. This lithography technique is a very promising process for three-dimensional nanofabrication.

• 出版日期2007-8
• 单位中国地震局