摘要
Resistance switching properties of nanostructured In2O3 films grown on LaNiO3 (LNO) bottom electrode (BE) have been investigated for non volatile memory applications. Ag/In2O3/LNO/SiO2 heterostructures were fabricated by pulsed laser deposition. Polycrystalline growth of oxides LNO and In2O3 was confirmed by GIXRD, while AFM show nanostructured growth with smooth surface morphology. Two terminal I-V characteristics showed reproducible two distinct resistance states in the film and unipolar type switching. Typical resistance switching ratio (R (on) /R (off) ) of the order of 112 % has been estimated at room temperature. A possible mechanism of the formation and rupture of conducting filament is proposed based on the Joule heating effect with external electron injection at the Ag/In2O3 top interface, whereas the LNO BE acts as oxygen reservoir at the In2O3/LNO interface.
- 出版日期2016-2