Mixed Nb2O5:MoO3 (95:5 and 85:15) thin films and their properties for electrochromic device applications

作者：Usha N; Sivakumar R^*; Sanjeeviraja C; Balasubramaniam R; Kuroki Y

来源：Journal of Materials Science: Materials in Electronics , 2016, 27(8): 7809-7821.

DOI：10.1007/s10854-016-4770-4

Nb2O5:MoO3 (95:5 and 85:15) thin films were deposited onto glass and fluorine doped tin oxide coated glass substrates at 100 and 300 A degrees C by RF magnetron sputtering technique. The physical and electrochromic properties of the films were studied. XRD result reveals that deposited films were amorphous. The XPS study confirms the compositional purity and the presence of Nb5+ and Mo6+ in the deposited film. Surface morphological study shows platelet like features of deposited film. The average transmittance of the film is varied between 91 and 85 %. Photoluminescence study exhibits three characteristic emission peaks and confirms the better optical quality of deposited film. Raman spectra show the LO-TO splitting of Nb-O stretching of the deposited film. Electrochromic behavior of the deposited films characterized by cyclic voltammetry using 0.5 M LiClO4 center dot PC and 0.5 M H2SO4 electrolyte solutions show all the films are having better reversibility and reproducibility in their electrochemical analysis.

• 出版日期2016-8