A new generation optical lithography using a third harmonic pulse generated by micro-ring resonators

作者：Yupapin P P^*; Chaiyasoonthorn S; Saneujit O

来源：Optik, 2010, 121(6): 563-566.

DOI：10.1016/j.ijleo.2008.09.012

• New generation lithography
• High-resolution lithography
• Nonlinear micro-ring resonator

We first propose a new system of a third harmonic generation by using a soliton pulse circulating in the integrated micro-ring devices. By using this system, the ultra-short pulse in the attosecond (as) and beyond can be easily generated. In principle, light pulse known as a soliton pulse is input into a design system. It consist the three-stage micro-ring resonators, where the ring radii are within the range between 5 and 35 mu m. With the appropriate parameters such as ring radius, coupling ratio and nonlinear refractive index, the attosecond pulse is generated by filtering the chaotic signals within the micro-ring devices. One of the results obtained has shown that the generation of the ultra narrow pulse (spectral width) and sharp tip is achieved. The potential of using such a pulse for picometer (pm)-scale lithography is plausible.

• 出版日期2010