科研之友
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摘要
Surface plasmon lithography using embedded-amplitude masks has received considerable attention in recent times for its ability to produce high density features with resolution beyond diffraction limit However plasmon damping caused due to intrinsic metal absorption restricts the achievable aspect ratio of the fabricated features One possible way to rectify this issue is to use a gain medium to amplify the surface plasmons and thereby increase their propagation length In this context this paper proposes a novel concept of employing dye medium to enhance plasmon propagation in mask based surface plasmon lithography so as to obtain higher transmission depth in the writing me
- 出版日期2010-12-15
- 单位南阳理工学院
