Development of SiO2 based thin film on metal foils for space application

作者：Reddy I Neelakanta; Reddy V Rajagopal; Sridhara N; Basavaraja S; Venkatanarayana M; Rao V Sasidhara; Sharma A K; Dey Arjun^*

来源：Ceramics International, 2013, 39(7): 8493-8498.

DOI：10.1016/j.ceramint.2013.02.082

• Microstructure
• Solar absorptance
• IR emittance
• SiO2-Al2O3
• Thin film
• Rf magnetron sputtering

Silica (SiO2) mono-layer and silica alumina (SiO2-Al2O3) bi-layer thin films were developed on both SS304 and Ti thin foils by pulsed rf magnetron sputtering. The solar absorptance (alpha(s)) and IR emittance (epsilon(ir)) of the films were measured. Both alpha(s) and epsilon(ir) of SS304 and Ti were increased after depositing SiO2 and SiO2-Al2O3 bi-layer thin film. The ratio of solar absorptance and IR emittance (i.e. alpha(s)/epsilon(ir)) can be tailored in a large range e.g. 3.3-0.850 for SS and 3.66-1.085 for Ti which is useful for many spacecraft subsystems to tailor their operating temperatures. Further, the microstructure, surface morphology and topography of the films were investigated by field emission scanning electron microscopy, energy dispersive X-ray spectroscopy and atomic force microscopy.

• 出版日期2013-9