A dynamic Monte Carlo study of the in situ growth of a substance deposited using electron-beam-induced deposition

作者：Liu Zhi Quan^*; Mitsuishi Kazutaka; Furuya Kazuo

来源：Nanotechnology, 2006, 17(15): 3832-3837.

DOI：10.1088/0957-4484/17/15/038

The in situ growth of a deposit in electron-beam-induced deposition (EBID) was studied by dynamic Monte Carlo simulation, showing first the preferential growth of deposit along the incident direction of the electron beam. The effects of electron energy, probe size, substrate thickness, and deposit (or substrate) composition on EBID were investigated and discussed, considering the electron scattering of not only secondary electrons but also primary and backscattered electrons in solids. By including the depositions at not only the top but also the bottom surfaces of the substrate, the growth model of the deposit in EBID was modified. Concerning the resolution of EBID, a small lateral size can be achieved on the deposit (or substrate) containing light atoms using a high-energy electron beam with a fine probe size.

• 出版日期2006-8-14