科研之友
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摘要
To decrease the high-frequency energy loss resulted from the low-pass property of reduction lens in DMD-based maskless lithography system, the digital division mask technique has been proposed. Three digital division methods have been developed to fabricate different types of microstructures, including periodic amplification division, bit coding division and the two combine. For verification of the proposed methods, simulations and experiments have been performed to fabricate binary grating, zigzag grating and other microstructures. Comparative exposure patterns reveal that these methods are versatile and reliable for improving the lithography quality of DMD-based system.
