Age hardening in (Ti1-xAlx)B2+Delta thin films

作者：Mockute A; Palisaitis J; Alling B; Berastegui P; Broitman E; Naslund L A; Nedfors N; Lu J; Jensen J; Hultman L; Patscheider J; Jansson U; Person P O A; Rosen J

来源：Scripta Materialia, 2017, 127: 122-126.

DOI：10.1016/j.scriptamat.2016.09.021

• Titanium diboride
• Thin films
• Mechanical properties
• Hardness

Thin films of (Ti0.71Al0.29)B2+1.08 have been deposited by magnetron sputtering. Post-deposition annealing at 1000 degrees C for 1 h results in increased hardness and elastic modulus, from 32 to 37 GPa and from 436 to 461 GPa, respectively. In both as-deposited and annealed states the films adhere well to the substrate, indicating no considerable internal stress. The initial high hardness is attributed to a columnar microstructure consisting of crystalline (Ti,Al)B-2 columns separated by an amorphous B matrix. The observed age hardening corresponds to phase separation within the (Ti,Al)B-2 columns including the formation of Ti-deficient crystallites within the grain interior upon annealing.

• 出版日期2017-1-15