Adjustable refractive index modulation for a waveguide with SU-8 photoresist by dual-UV exposure lithography

作者：Ong Biow Hiem^*; Yuan Xiaocong; Tjin Swee Chuan

来源：Applied Optics, 2006, 45(31): 8036-8039.

DOI：10.1364/AO.45.008036

We present a new fabrication technique based on a two-step UV exposure lithographic process to marginally modulate the refractive index in commercial SU-8 photoresist. This technique achieves refractive index modulation as different regions undergo different thermal densification prior to UV-induced polymerization. A small refractive index contrast of 0.0008 or lower can be achieved, and this is especially useful for fabricating waveguides with a low level of propagation modes. This technique may be extended to other UV-curable epoxy photoresists and can easily be applied in the fabrication of optical elements such as optical interconnects and integrated optical sensors without the development process.

• 出版日期2006-11-1
• 单位南阳理工学院