Anode oxidation of HCHO in THPED-containing electroless copper plating solution

作者：Zheng Ya jie^*; Xiao Fa xin; Zou Wei hong; Wang Yong

来源：Journal of Central South University of Technology, 2008, 15(5): 669-673.

DOI：10.1007/s11771-008-0124-6

• electroless copper plating
• anode oxidation
• THPED
• HCHO
• electrochemical mechanism

The electrochemical mechanism of anode oxidation of HCHO in electroless copper plating solution with N, N, N', N'-tetrakis(2-hydroxypropyl)ethylenediamine (THPED) was investigated by measuring cyclic voltammetry curves and anodic polarization curves. Three different oxidation peaks occur at the potentials of -0.62 V (Peak 1), -0.40 V (Peak 2) and -0.17 V (Peak 3) in the anode oxidation process of THPED-containing solution. The reaction at Peak 1, a main oxidation reaction, is the irreversible reaction of adsorbed HCHO with hydrogen evolution. The reaction at Peak 2, a secondary oxidation reaction, is the quasi-reversible reaction of adsorbed HCHO without hydrogen evolution. The reaction at Peak 3 is the irreversible oxidation of anode copper. The current density of Peak 1 increases gradually, that of Peak 2 remains constant and that of Peak 3 decreases with the increase of HCHO concentration. The current density of Peak 3 increases with the increase of THPED concentration and the complexation of THPED promotes the dissolution of anode copper.

• 出版日期2008-10
• 单位中南大学; 河南大学