Nitrogen Radical and Plasma Diagnostics in Dual Frequency Hybrid Plasmas to Investigate N-2/SiH4 PECVD Process

作者：Sahu Bibhuti Bhusan^*; Han Jeon Geon; Shin Kyung Sik; Hori Masaru

来源：Plasma Processes and Polymers, 2016, 13(4): 447-458.

DOI：10.1002/ppap.201500116

• PECVD
• radical diagnostic
• RF compensated Langmuir Probe
• RF/UHF dual frequency plasmas
• silicon nitride film
• VUVAS

The present work addresses a systematic approach for measuring the atomic nitrogen radicals using vacuum ultraviolet absorption spectroscopy (VUVAS) in the N-2-SiH4 PECVD processes using alternate plasma concepts. Measurements using VUVAS and RF compensated Langmuir probe reveal that there is significant enhancement in the radical and plasma density when the discharge is operated using the dual frequency hybrid source using the combination of a low and a very high-frequency source. The behavior of low frequency and dual frequency capacitively coupled plasma (CCP) discharges is experimentally investigated. This study also presents a detailed analysis and effectiveness of the dual frequency hybrid plasmas for the practical applications.

• 出版日期2016-4