Analysis of the output irradiance uniformity of integrating sphere source

作者:He Yingwei*; Li Ping; Wu Houping; Li Cheng; Xiong Limin; Meng Haifeng; Liu Dingpu; Zhang Jieyu; Zhang Junchao
来源:6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment , 2012-04-26 to 2012-04-29.
DOI:10.1117/12.978690

摘要

Regarding to the mistakes that optoelectronic devices such as CCD focal plane arrays devices are often placed on the exit port plane of integrating sphere source to perform calibration, the output irradiance uniformity of integrating sphere source is analyzed, the basis which rational using the integrating sphere source to calibrate the optoelectronic devices is obtained. Two theoretical output irradiance uniformity models based on numerical analysis method and Monte Carlo method are developed respectively. The models consider two fundamental situations of integrating sphere sources, namely (1) ideal lambertian source and (2) non-ideal lambertian source. The distribution regularity of irradiance uniformity was generalized by contrast of the theoretical data obtained by the models and the measured data obtained by two different actual integrating sphere sources. The results show that when (1) the diameter of optoelectronic device is less than half diameter of the sphere exit port, and (2)the ratio of the distance from device to exit port and the exit port diameter are between 3 and 5, a 99% better output irradiance uniformity can be obtained. The results provide a practical guide to ensure the accuracy of the calibration exercise of optoelectronic devices.

  • 出版日期2012

全文