AFM investigation of effect of absorbed water layer structure on growth mechanism of octadecyltrichlorosilane self-assembled monolayer on oxidized silicon

作者：Li, Shaowei; Zheng, Yanjun^*; Chen, Changfeng

来源：Journal of Chemical Physics, 2016, 144(24): 244709.

DOI：10.1063/1.4954835

• SOLID-LIQUID INTERFACE
• SURFACES
• FORCE
• ALKYLSILOXANES
• SOLVENT
• OXIDE

The growth mechanism of an octadecyltrichlorosilane (OTS) self-assembled monolayer on a silicon oxide surface at various relative humidities has been investigated. Atomic force microscopy images show that excess water may actually hinder the nucleation and growth of OTS islands. A moderate amount of water is favorable for the nucleation and growth of OTS islands in the initial stage; however, the completion of the monolayer is very slow in the final stage. The growth of OTS islands on a low-water-content surface maintains a relatively constant speed and requires the least amount of time. The mobility of water molecules is thought to play an important role in the OTS monolayers, and a low-mobility water layer provides a steady condition for OTS monolayer growth. Published by AIP Publishing.

• 出版日期2016-6-28
• 单位中国石油大学（北京）