摘要

Memory-state [low-resistance state (R-L) and high-resistance state (R-H)] dependence of random telegraph noise (RTN) of Ta2O5/TiO2 resistive random access memory is investigated. The conduction mechanism of both memory states and a limit of resistance controllability are also investigated to clarify the difference in the RTN mechanism of both states. The boundary between the R-L and R-H states was found at 5-20 k Omega, and the conduction mechanism much depended on the memory state. The noise also depended on the memory state. The noise amplitude in the R-H state was larger than that in the R-L state. In the R-H state, a tunnel barrier was generated to cut off a conduction path (filament), and traps inside the tunnel barrier were supposed to increase the noise amplitude. Moreover, the composition of the following degraded the noise distribution in the R-H state: 1) capture and emission of charges with traps and 2) instability of these traps against the bias temperature stress.

  • 出版日期2010-11