Au-PVA Nanocomposite Negative Resist for One-Step Three-Dimensional e-Beam Lithography

作者：Marques Hueso Jose; Abargues Rafael^*; Canet Ferrer Josep; Agouram Said; Luis Valdes Jose; Martinez Pastor Juan P

来源：Langmuir, 2010, 26(4): 2825-2830.

DOI：10.1021/la90295n

An nanoparticles are synthesized in situ upon the electron beam exposure of a poly(vinyl alcohol) (PVA) thin film containing Au(III). The e-beam-irradiated areas are insoluble in water (negative-tone resist), and AU-PVA nanocomposite patterns with a variable profile along the structure can be thus generated (3D lithography) in a single step. A local characterization of the generated patterns is performed by high-resolution transmission electron microscopy and UV-vis localized Surface plasmon resonance microspectroscopy. This characterization confirms the presence of crystalline nanoparticles and aggregates.

• 出版日期2010-2-16