科研之友
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摘要
This paper investigates the distribution of irradiance of annulus apertures in the optical proximity printing process as it is a major factor affecting pattern distortion. Two dimensional and three dimensional irradiance distributions on the projected photoresist for annulus-aperture masks are analyzed. The results showed that diffraction results in the non-uniformity of the projected pattern in proximity printing. The boundaries between the exposed and shaded areas are blurred, which results in imprecise of the transferred pattern, when xi(x), the ratio of the gap between the mask and the photoresist to the outer radius of the aperture, increases. It also found that the intensity of exposition moves to the outer area when xi(r) and xi(lambda), the ratio of the inner radius and the wavelength to the outer radius, increases. Experimental results showed fairly consistency between the projected images and the simulations though further verification is suggested for quantitative confirmation.
- 出版日期2014-6
