Microstructure, mechanical, and tribological properties of hydrogenated amorphous carbon film deposited on Ti6Al4V alloy under different substrate bias voltage

作者：Huang, Weijiu; Ma, Jianjun; Wang, Junjun^*; Wang, Linqing; Tian, Zhongqing

来源：International Journal of Advanced Manufacturing Technology, 2018, 94(5-8): 2491-2497.

DOI：10.1007/s00170-017-0947-0

• Ti6Al4Valloy
• a-C/H film
• Magnetron sputtering
• Substrate bias voltage
• Tribological property

The aim of this work is to find how substrate bias affect the microstructure, mechanical, and tribological properties of the a-C/H films deposited on Ti6Al4V by magnetron sputtering. In order to attain this purpose, the structure of the deposited a-C/H film was investigated by scanning electron microscopy. Chemical bonding was examined by Raman spectroscopy techniques. Mechanical and tribological properties were evaluated using nanoindentation, scratch, internal stress, and ball-on-disk friction testing. The results showed that the sp(2) content in a-C/H films increased as the bias voltage increased from -400 to -1200 V, indicating the graphitization of the films. The hardness (H) decreased from 29 to 18 GPa and the adhesion strength ranged from 13.1 to 25.3 N with increasing bias substrate. The average friction coefficient decreased at a bias voltage of -300 Vand increased when the bias voltage increased to -1200 V. The best tribological performance was reached at -600 V bias voltage. Reasons for the changing of structures, mechanical and tribological properties of a-C/H films were proposed.

• 出版日期2018-2
• 单位重庆理工大学