科研之友
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摘要
Conventional optical photolithography is used to create photoresist patterns on a preformed silica colloidal crystal film. Upon regrowth of the same silica colloidal crystal followed by removal of the photoresist patterns, air-core line defects are successfully introduced into the self-assembled silica colloidal crystal (see Figure and inside cover).
- 出版日期2005-8-4
