Deterministic tuning of slow-light in photonic-crystal waveguides through the C and L bands by atomic layer deposition

作者：Chen Charlton J^*; Husko Chad A; Meric Inanc; Shepard Ken L; Wong Chee Wei; Green William M J; Vlasov Yurii A; Assefa Solomon

来源：Applied Physics Letters, 2010, 96(8): 081107.

DOI：10.1063/1.3308492

• hafnium compounds
• optical fabrication
• optical interconnections
• photonic crystals

We demonstrate digital tuning of the slow-light regime in silicon photonic-crystal waveguides by performing atomic layer deposition of hafnium oxide. The high group-index regime was deterministically controlled (redshift of 140 +/- 10 pm per atomic layer) without affecting the group-velocity dispersion and third-order dispersion. Additionally, differential tuning of 110 +/- 30 pm per monolayer of the slow-light TE-like and TM-like modes was observed. This passive postfabrication process has potential applications including the tuning of chip-scale optical interconnects, as well as Raman and parametric amplification.

• 出版日期2010-2-22
• 单位IBM