Deposition mechanism of aluminum on uranium in AlCl3-1-ethyl-3-methylimidazolium chloride ionic liquid by galvanic displacement

作者：Jiang, Yidong; Fang, Liping; Luo, Lizhu; Wang, Shaofei; Wang, Xiaolin^*

来源：Journal of Applied Electrochemistry, 2018, 48(7): 827-834.

DOI：10.1007/s10800-018-1204-4

• Galvanic deposition
• Ionic liquid
• Aluminum nano-layer

Aluminum (Al) coatings, which are found to be dendrites, have been deposited on uranium (U) substrate in ionic liquid via galvanic displacement. Interestingly, a dense Al nano-layer has formed between the Al dendrites and the U substrate. In this work, the growth mechanism of the Al coating has been investigated by ultraviolet-visible spectroscopy, scanning electron microscopy, grazing incidence X-ray diffraction, and electrochemical measurements: the galvanic reaction sees the oxidation of U from the substrate while Al2Cl7 (-) are reduced on its surface, driven by the electrochemical potential difference between Al and U. Furthermore, we have found that the Al nano-layer passivates the uranium surface, which is proved to be the rate limiting step in the galvanic deposition process; the observation of the interface morphology evolution process indicates that this Al nano-layer grows in a three-dimensional mode. This work demonstrates a convenient approach to deposit dense Al nano-layer on U, without any external power source. @@@ [GRAPHICS] @@@ .

• 出版日期2018-7
• 单位中国科学技术大学