摘要
High quality diamond epitaxial layers are prepared on polycrystalline and single-crystal diamonds by MPCVD. Field-effect transistors with gate length of 1 pm are fabricated by self-aligned process on them. The surface p-type channel of the diamond films were obtained by microwave hydrogen plasma treatment. The DC and RF characteristics of the field-effect transistors are compared. The polycrystalline diamond FETs show better DC and small-signal performance. Single-crystal diamond FETs show higher breakdown voltage and output power density due to its high crystal quality. The maximum output power density reaches 320 mW/mm and 450 mW/mm@1GHz for the polycrystalline diamond and single crystal diamond transistors, respectively.
- 出版日期2016-11
- 单位西安交通大学