Apparatus for measuring Seebeck coefficient and electrical resistivity of small dimension samples using infrared microscope as temperature sensor

作者：Jaafar W M N Wan^*; Snyder J E; Min Gao

来源：Review of Scientific Instruments, 2013, 84(5): 054903.

DOI：10.1063/1.4805016

An apparatus for measuring the Seebeck coefficient (alpha) and electrical resistivity (rho) was designed to operate under an infrared microscope. A unique feature of this apparatus is its capability of measuring alpha and rho of small-dimension (sub-millimeter) samples without the need for microfabrication. An essential part of this apparatus is a four-probe assembly that has one heated probe, which combines the hot probe technique with the Van der Pauw method for %26quot;simultaneous%26quot; measurements of the Seebeck coefficient and electrical resistivity. The repeatability of the apparatus was investigated over a temperature range of 40 degrees C-100 degrees C using a nickel plate as a standard reference. The results show that the apparatus has an uncertainty of +/- 4.9% for Seebeck coefficient and +/- 5.0% for electrical resistivity. The standard deviation of the apparatus against a nickel reference sample is -2.43 mu VK-1 (-12.5%) for the Seebeck coefficient and -0.4 mu Omega cm (-4.6%) for the electrical resistivity, respectively.

• 出版日期2013-5