Nanostenciling for fabrication and interconnection of nanopatterns and microelectrodes

作者：Guo Haiming; Martrou David; Zambelli Tomaso; Polesel Maris Jerome; Piednoir Agnes; Dujardin Erik; Gauthier Sebastien^*; van den Boogaart Marc A F; Doeswijk Lianne M; Brugger Juergen

来源：Applied Physics Letters, 2007, 90(9): 093113.

DOI：10.1063/1.2710473

Stencil lithography is used for patterning and connecting nanostructures with metallic microelectrodes in ultrahigh vacuum. Microelectrodes are fabricated by static stencil deposition through a thin silicon nitride membrane. Arbitrary nanoscale patterns are then deposited at a predefined position relative to the microelectrodes, using as a movable stencil mask an atomic force microscopy (AFM) cantilever in which apertures have been drilled by focused ion beam. Large scale AFM imaging, combined with the use of a high precision positioning table, allows inspecting the microelectrodes and positioning the nanoscale pattern with accuracy better than 100 nm.

• 出版日期2007-2-26