Annealing effect on the structural and electrical performance of Mn-Co-Ni-O films

作者：Zhang, Fei; Zhou, Wei; OuYang, Cheng; Wu, Jing; Gao, Yanqing; Huang, Zhiming

来源：AIP Advances, 2015, 5(11): 117137.

DOI：10.1063/1.4936338

• OXYGEN PARTIAL-PRESSURE
• THIN-FILMS
• NTC CHARACTERISTICS
• SPINEL FILMS
• TEMPERATURE
• THERMISTORS
• RESISTIVITY
• FABRICATION
• DETECTORS
• OXIDES

Thin films of Mn1.95Co0.77Ni0.28O4 are deposited on amorphous Al2O3 substrate by the magnetron sputtering method with the thickness of 6.5 mu m. The effects of annealing treatment are studied on the film structural performance as well as the entropy of Mn-Co-Ni-O(MCNO) films by annealed at 400 degrees C, 500 degrees C, 600 degrees C, 700 degrees C, 800 degrees C respectively. It shows that the crystallinity of the thin film is the best annealed at 700 degrees C and the entropy is the largest because the number of different kinds of ions belonging to the same element equals with each other. After 800 degrees C annealing, the film resistivity is the minimal with the maximal entropy which means the highest stability.

• 出版日期2015-11
• 单位中国科学院上海技术物理研究所