MECHANICAL PROPERTIES OF ULTRANANOCRYSTALLINE THIN FILMS DEPOSITED USING DUAL FREQUENCY DISCHARGES

作者：Bursikova Vilma^*; Blahova Olga; Karaskova Monika; Zajickova Lenka; Jasek Ondrej; Franta Daniel; Klapetek Petr; Bursik Jiri

来源：Chemicke Listy, 2011, 105: S98-S101.

• ultrananocrystalline diamond
• plasma enhanced chemical vapor deposition
• dual frequency discharge
• local mechanical properties

The present paper describes the deposition of nanostructured diamond films with low surface roughness, high hardness and fracture toughness by microwave PECVD in the ASTeX type reactor from mixture of methane and hydrogen. Films were deposited on a mirror polished (111) oriented n-doped silicon substrate. The film exhibited relatively low roughness, the root mean square (RMS) of heights ranged from 20 to 9.1 nm, depending on the deposition conditions. The hardness was found to be in the range from 22 to 65 GPa and the elastic modulus ranged from 220 to 375 GPa, depending on the film structure.

• 出版日期2011