Substrate temperature influence on boron carbide coatings grown by the PLD technique

作者：Castillo H A; Restrepo Parra E^*; Velez J M; de la Cruz W

来源：Surface and Coatings Technology, 2011, 205(12): 3607-3612.

DOI：10.1016/j.surfcoat.2010.12.043

• h-BC
• PLD
• XPS
• TEM
• Electron diffraction
• Substrate temperature

Boron carbide films were synthesized by laser ablation technique, using a target of B4C with 99.9% of purity, varying the substrate temperature between room temperature and 650 degrees C, in order to produce the hexagonal phase (h-BC). Films were grown on (111)-silicon wafers in an ultra high vacuum system with a base pressure in the order of 10(-7) Pa. For the films' growth, an atmosphere of (CH4) at a pressure of 2.5 Pa was used. During the process, the substrate temperature was varied in order to identify the influence of this parameter on the coatings' structure, composition and morphology. XRD analysis did not present peaks of BC, possibly because of the amorphous character of the film that has different phases. Films were characterized by several techniques as in situ Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS) and ex situ electron diffraction. Results present a concentration of 50 at.% for the sample grown to 650 degrees C. Electron diffraction showed an interplanar spacing (d((002)) = 0.334 nm) and also other hkl reflections have been identified. Lattice parameters calculated from the interplanar spacing a = 0.585 nm and c = 1.2 nm obtained for the sample grown at 650 degrees C are similar to those reports for hexagonal boron carbide.

• 出版日期2011-3-15