Extended incident-angle dependence formula for physical sputtering

作者:Ono T*; Shibata K; Kenmotsu T; Muramoto T; Li Z; Kawamura T
来源:Journal of Nuclear Materials, 2007, 363: 1266-1271.
DOI:10.1016/j.jnucmat.2007.01.178

摘要

We extend a new semi-empirical formula for incident-angle dependence of normalized sputtering yield that includes the contribution from the direct knock-out process to the sputtering yield. This was not considered fully in the previous sputtering formula. Three parameters included in the new formula are estimated for data calculated with a Monte Carlo code ACAT for D(+) ions incident obliquely on C, Fe and W materials in incident energy regions from several tens of eV to 10 keV. Then, the parameters are expressed as a function of incident energy. The extended formula with these functions well reproduces the calculated data of normalized sputtering yield in the whole energy ranges.