摘要

Surfaces of thoroughly cleaned [311] silicon were nanostructured in air and deionised water medium by excimer laser at laser fluence of 2 J/cm(2), reprate of 1 Hz and irradiated for 100 laser pulses. Nanostructured surfaces were characterized by laser scanning confocal microscope and atomic force microscopy and it was observed that more isolated features can be achieved at nanoscale in deionised water medium. Surface roughness was found lesser in the case of water medium. For the same laser fluence and number of laser pulses used to nanostructure, red lumininescence was observed in case of air medium while green luminescence was observed for the deionized water medium.

  • 出版日期2010-3

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