Apparel pattern modeling based on tabular layouts of article characteristics

作者：Li Xiang Shuo^*; Qi Guo Ning; Yang Qing Hai; Gu Xin Jian

来源：Computer Integrated Manufacturing Systems, 2007, 13(5): 856-861.

• Apparel design
• Mass customization
• Pattern modeling
• Resource database
• Sach MerkLeisten technology
• Tabular layouts of article characteristics
• Variant design

To support the agile design for apparel customization, the tabular layouts of article characteristics (SML) was introduced into the apparel pattern modeling. Firstly, the method of pattern parameter analysis was illuminated, and the relationships between the control points of geometry model and the parameters were studied. Then the reuse pattern geometry model was established, and the extraction rules of the article characteristics was also discussed. To describe the pattern modeling and the reuse process, the logic framework of the apparel pattern modeling based on SML was constructed, and associations among the customs'; individualized information, resource database and the matching rules were formally described. Supported by this logic framework, knowledge reuse and the pattern variant design were realized. Finally, an instance of the apparel pattern modeling and variant design for suit was given.

• 出版日期2007
• 单位浙江大学