Application of amorphous carbon based materials as antireflective coatings on crystalline silicon solar cells

作者：da Silva D S^*; Cortes A D S; Oliveira M H Jr; Motta E F; Viana G A; Mei P R; Marques F C

来源：Journal of Applied Physics, 2011, 110(4): 043510.

DOI：10.1063/1.3622515

We report on the investigation of the potential application of different forms of amorphous carbon (a-C and a-C:H) as an antireflective coating for crystalline silicon solar cells. Polymeric-like carbon (PLC) and hydrogenated diamond-like carbon films were deposited by plasma enhanced chemical vapor deposition. Tetrahedral amorphous carbon (ta-C) was deposited by the filtered cathodic vacuum arc technique. Those three different amorphous carbon structures were individually applied as single antireflective coatings on conventional (polished and texturized) p-n junction crystalline silicon solar cells. Due to their optical properties, good results were also obtained for double-layer antireflective coatings based on PLC or ta-C films combined with different materials. The results are compared with a conventional tin dioxide (SnO(2)) single-layer antireflective coating and zinc sulfide/magnesium fluoride (ZnS/MgF(2)) double-layer antireflective coatings. An increase of 23.7% in the short-circuit current density, J(sc), was obtained using PLC as an antireflective coating and 31.7% was achieved using a double-layer of PLC with a layer of magnesium fluoride (MgF(2)). An additional increase of 10.8% was obtained in texturized silicon, representing a total increase (texturization + double-layer) of about 40% in the short-circuit current density. The potential use of these materials are critically addressed considering their refractive index, optical bandgap, absorption coefficient, hardness, chemical inertness, and mechanical stability.

• 出版日期2011-8-15