Drain-induced barrier lowering effect for short channel dual material gate 4H silicon carbide metal-semiconductor field-effect transistor

作者：Zhang Xian Jun^*; Yang Yin Tang; Duan Bao Xing; Chai Chang Chun; Song Kun; Chen Bin

来源：Chinese Physics B, 2012, 21(9): 097302.

DOI：10.1088/1674-1056/21/9/097302

• silicon carbide
• metal-semiconductor contact
• dual material gate

Sub-threshold characteristics of the dual material gate 4H-SiC MESFET (DMGFET) are investigated and the analytical models to describe the drain-induced barrier lowering (DIBL) effect are derived by solving one- and two-dimensional Poisson's equations. Using these models, we calculate the bottom potential of the channel and the threshold voltage shift, which characterize the drain-induced barrier lowering (DIBL) effect. The calculated results reveal that the dual material gate (DMG) structure alleviates the deterioration of the threshold voltage and thus suppresses the DIBL effect due to the introduced step function, which originates from the work function difference of the two gate materials when compared with the conventional single material gate metal semiconductor field-effect transistor (SMGFET).

• 出版日期2012-9
• 单位西安电子科技大学