A double-plasma source of continuous bipolar ion-ion beam

作者：Dudin S V; Rafalskyi D V^*

来源：Applied Physics Letters, 2013, 102(3): 034102.

DOI：10.1063/1.4788711

A double-plasma source capable of the generation of a continuous bipolar ion-ion beam is described. The quasi-neutral ion-ion flow to an extraction electrode is formed in the system containing primary inductively coupled plasma separated from a secondary plasma by an electrostatic grid-type filter. The total current of each ion species to the 250mm diameter extraction electrode is about 80mA; the electron current does not exceed 30% of the ion current. Method of positive/negative ion current ratio control is proposed, allowing the ion currents ratio variation in wide range.

• 出版日期2013-1-21