Comparative Surface Study on Silicon Dioxide Film Covered with Alcohols

作者：Sato Nobuyoshi^*; Shimogaki Yukihiro

来源：ECS Journal of Solid State Science and Technology, 2014, 3(1): N3001-N3005.

DOI：10.1149/2.001401jss

We investigated the relative coverage of an alcohol adsorbed on silicon dioxide (SiO2) film by angle resolved X-ray photoelectron spectroscopy (ARXPS). We found that both Si 2p (103.3 eV; Si-O) and O 1s (532.5 eV; Si-O) spectra decreased in order of IPA > ethanol > methanol through all takeoff angles. In addition, both spectra decreased as the takeoff angle decreased in these alcohol treatments. The C 1s (284.6 eV; C-H) spectrum increased in order of IPA < ethanol < methanol through all takeoff angles, and increased as the takeoff angle decreased. Both Si 2p and O 1s signal intensities could be affected by the amount of carbon on the surface during takeoff of the X-ray. We hypothesize that alcohols are adsorbed on the outermost surface of SiO2 film and that the surface may be sufficiently covered with methyl groups or methanol. However, the surface is not completely covered with ethyl groups or propyl groups. The relative coverage of alcohols adsorbed on the SiO2 film in addition to their water contact angles are discussed in greater detail.

• 出版日期2014