Resistivity in rough metallic thin films: A Monte Carlo study

作者:Rickman J M*; Barmak K
来源:Journal of Applied Physics, 2012, 112(1): 013704.
DOI:10.1063/1.4732082

摘要

The impact of interfacial roughness on the resistivity of thin copper films is examined using Monte Carlo simulation. In particular, after comparing the results of the Fuchs-Sondheimer model with those obtained from the simulation of a film bounded by flat surfaces, we highlight the role of collisions with two rough surfaces on electron trajectories. We then calculate the resistivity as a function of the amplitude of interfacial roughness and provide an interpretation of our results in terms of a simple trapping model in which conduction electrons are temporarily localized in surface indentations.

  • 出版日期2012-7-1