Atomic layer deposition: medical and biological applications

作者：Skoog S A; Elam J W; Narayan R J^*

来源：International Materials Reviews, 2013, 58(2): 113-129.

DOI：10.1179/1743280412Y.0000000009

• Surface modification
• Metal surface treatment
• Ceramic structure

Atomic layer deposition (ALD) is being used for deposition of conformal thin films on a variety of materials, including medical device materials and biologically derived materials. This review describes thin film deposition on materials using ALD for bioelectronic device, implantable device, biosensor, drug delivery device, tissue engineering scaffold and bioassay device applications. Recent advances in ALD technology, including low temperature ALD of thin films on temperature sensitive substrates, are considered. Finally, translation of ALD to commercial use, including use of ALD by the medical device industry, is described.

• 出版日期2013-2