Development of large diameter ECR plasma source

作者：Kawai Yoshinobu^*; Uchino Kiichiro; Muta Hiroshi; Kawai Shinji; Roewf Tobias

来源：Vacuum, 2010, 84(12): 1381-1384.

DOI：10.1016/j.vacuum.2009.12.023

• ECR plasma
• Large area plasma source
• Upper hybrid resonance
• L-cutoff density
• Ion saturation current

To develop ECR plasma source for industrial applications, we produced a large diameter ECR plasma and examined radial profiles of the ion saturation current as a function of pressure and power. It was found that ECR plasma uniform over 300 mm is produced for pressures higher than 1 mTorr and the electron temperature decreases with increasing pressures.

• 出版日期2010-6-25