Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layers

作者：Puttaswamy Manjunath; Vehkamaki Marko; Kukli Kaupo^*; Dimri Mukesh Chandra; Kemell Marianna; Hatanpaa Timo; Heikkila Mikko J; Mizohata Kenichiro; Stern Raivo; Ritala Mikko; Leskela Markku

来源：Thin Solid Films, 2016, 611: 78-87.

DOI：10.1016/j.tsf.2016.05.006

• Multiferroic
• Heterostructures
• Atomic layer deposition
• Ferromagnetic
• Ferroelectric

Bismuth iron oxide films with varying contributions from Fe2O3 or Bi2O3 were prepared using atomic layer deposition. Bismuth (III) 2,3-dimethyl-2-butoxide, was used as the bismuth source, iron(III) tert-butoxide as the iron source and water vapor as the oxygen source. The films were deposited as stacks of alternate Bi2O3 and Fe2O3 layers. Films grown at 140 degrees C to the thickness of 200-220 nm were amorphous, but crystallized upon post-deposition annealing at 500 degrees C in nitrogen. Annealing of films with intermittent bismuth and iron oxide layers grown to different thicknesses influenced their surface morphology, crystal structure, composition, electrical and magnetic properties. Implications of multiferroic performance were recognized in the films with the remanent charge polarization varying from 1 to 5 mu C/cm(2) and magnetic coercivity varying from a few up to 8000 A/m.

• 出版日期2016-7-29