A study of atomic layer deposited LiAlxOy films on Mg-Li alloys

作者：Wang P C; Shih Y T; Lin M C; Lin H C^*; Chen M J; Lin K M

来源：Thin Solid Films, 2010, 518(24): 7501-7504.

DOI：10.1016/j.tsf.2010.05.033

• Atomic layer deposition
• LiAlxOy film
• Mg-Li alloy
• Corrosion resistance

LiAlxOy films with thicknesses of 65-200 nm were deposited by the atomic layer deposition (ALD) technique on the LZ101 Mg-Li alloy. The ALD-deposited LiAlxOy films exhibit an amorphous structure and have an atomic ratios of Li:Al:O=1:1:2. The potentio-dynamic polarization tests show that the corrosion resistance of Mg-Li alloys can be significantly improved due to the dense and pinhole-free structure as well as the excellent coverage and conformity of the ALD-deposited LiAlxOy films.

• 出版日期2010-10-1