科研之友
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摘要
Diffusion of metal atoms on highly perfect planes was one of the first surface phenomena to be examined on the atomic level. This was made possible through the unique capability of the field ion microscope to routinely reveal individual adatoms. Despite subsequent advances in observational techniques, such as the development of high-resolution electron microscopes and the scanning tunneling microscope, current understanding of the diffusion behavior of metal atoms is still based primarily upon field ion microscopic studies. The results of this overall effort are briefly surveyed, with special emphasis upon factors important in crystal growth: structural specificities in diffusion, mobility during deposition, the mechanisms of atomic jumps, and the motion of clusters. From the data now available it appears that surface diffusion is a more complicated and interesting process than anticipated.
- 出版日期1991-4
