Atomic layer deposition TiO2/Al2O3 nanolayer of dyed polyamide/aramid blend fabric for high intensity UV light protection

作者：Xiao Xingfang; Liu Xin; Cao Genyang; Zhang Chunhua; Xia Liangjun; Xu Weilin; Xiao Shili^*

来源：Polymer Engineering and Science, 2015, 55(6): 1296-1302.

DOI：10.1002/pen.24068

Ultraviolet (UV) irradiation can cause a severe damage to textiles, such as color fading, polymer degradation, and mechanical strength decrease. The aim of this study was to deposit inorganic UV blocking agents onto polyamide/aramid dyed fabric using atomic layer deposition (ALD) technique to produce functional fabrics that are resistant to high intensity UV light. Scanning electron microscopy (coupled to energy-dispersive spectroscopy), X-ray photoelectron spectroscopy, and thermogravimetry studies demonstrated that TiO2, Al2O3, and TiO2/Al2O3 nanolayer could be successfully deposited onto the fiber surface. The dyed fabrics with different ALD coatings showed excellent high intensity UV resistance and were also more resistant to high intensity UV-induced mechanical strength damage. These results suggested that the ALD technology could be effective technique to improve the properties of dyed fabrics. POLYM. ENG. SCI., 55:1296-1302, 2015.

• 出版日期2015-6
• 单位武汉纺织大学