摘要
Thick ferrite films are promising for various applications, including miniaturized energy harvesters, inductor-on-chip applications, microelectromechanical systems (MEMS), and microwave devices. Here, a wet-chemical (thermal decomposition method) for high-quality and epitaxial thick ferrite is successfully developed. A silicon-technology compatible process is developed, by which highly textured Fe3O4 can be grown on a Si substrate with a MgO seed layer and patterned structures can be relatively easily realized. As-prepared Fe3O4 thick films demonstrate their potential applications for microwave and MEMS supercapacitors. Different ferrite compounds are successfully fabricated, including Co-ferrite with high coercivity and perpendicular anisotropy, and Ni-ferrite with high resistivity and enhanced magnetization. The method is demonstrated to also be suitable for the deposition of thick ZnO films. High conductivity is obtained in Al-doped ZnO thick films.
- 出版日期2015-10